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tALD Series

BEILab ALD 정보 리스트
Name BEILab Study Series - ALD 8 inch
Main dimensions 1000 x 660 x 1080 (L x W x H)
Substrate temperature range RT ~ 330℃
ALD type  Thermal ALD (flow-through type)
Precursor Multi-source supplies
Sample size 2, 4, 8, or 12 inch in diameter
Film uniformity ≤5% (Al2O3 within 8”)
MFC flow rate (Ar, N2) 0 ~ 500 sccm
Wafer loading Open load
User interface Desktop-window GUI
Ultimate pressure (rotary pump)

~ 10-3  torr