Commercialization @ BEILab
±â¼úÀÀ¿ë @ ºñÀ̾ÆÀÌ·¦

Product > tALD Series

tALD Series

BEILab ALD Á¤º¸ ¸®½ºÆ®
Name BEILab Study Series - ALD 2 inch
Main dimensions 1000 x 660 x 1080 (L x W x H)
Substrate heating  Top / bottom dual heat-up for thermal uniformity
Substrate temperature range RT ~ 330¡É
Source temperature range RT ~ 120¡É
ALD type  Thermal ALD (flow-through type)
Precursor Multi-source supplies
Delivery type Injection of vaporized source with carrier gas 
Highly reliable valves KITZ (JAPAN) 
Sample size 2, 4, 6, 8 inch in diameter 
Loading wafer type Silicon wafer, glass, etc  
Film uniformity ¡Â5% (Al2O3 within 8¡±)
MFC flow rate (Ar, N2) 0 ~ 500 sccm
Chamber inner space height ~8mm
Foot print 660 x 1000 mm
Wafer loading Open load
Vacuum gauge  Capacitance manometer (up to 10 Torr)
User interface Desktop-window GUI
Ultimate pressure (rotary pump)

~ 10-3  torr