Commercialization @ BEILab 기술응용 @ 비이아이랩
Product > tALD Series
| Name | BEILab Study Series - ALD 2 inch |
|---|---|
| Main dimensions | 1000 x 660 x 1080 (L x W x H) |
| Substrate heating | Top / bottom dual heat-up for thermal uniformity |
| Substrate temperature range | RT ~ 330℃ |
| Source temperature range | RT ~ 120℃ |
| ALD type | Thermal ALD (flow-through type) |
| Precursor | Multi-source supplies |
| Delivery type | Injection of vaporized source with carrier gas |
| Highly reliable valves | KITZ (JAPAN) |
| Sample size | 2, 4, 6, 8 inch in diameter |
| Loading wafer type | Silicon wafer, glass, etc |
| Film uniformity | ≤5% (Al2O3 |
| MFC flow rate (Ar, N2 |
0 ~ 500 sccm |
| Chamber inner space height | ~8mm |
| Foot print | 660 x 1000 mm |
| Wafer loading | Open load |
| Vacuum gauge | Capacitance manometer (up to 10 Torr) |
| User interface | Desktop-window GUI |
| Ultimate pressure (rotary pump) |
~ 10-3
|
