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tALD Series

BEILab ALD 2 inch
Compact. Economic. Powerful.

BEILab t ALD Study Series is excellent for academic research and company R&D. Our distinctive surface coating technology has been applied to this equipment and therefore it is possible to expand it to customized platform with option modules on request.


BEILab tALD Study Series는
학술 연구 및 기업 R&D 을 위한 ALD 연구장비로 탁월합니다. 독자적 계면 코팅 기술을 적용한 장비로 개별 요구사항에 따라 옵션 모듈 적용하여 맞춤형 플랫폼으로 확장이 가능합니다.

BEILab ALD 정보 리스트
Name BEILab Study Series - ALD 2 inch
Main dimensions 1000 x 660 x 1080 (L x W x H)
Substrate heating  Top / bottom dual heat-up for thermal uniformity
Substrate temperature range RT ~ 330℃
Source temperature range RT ~ 120℃
ALD type  Thermal ALD (flow-through type)
Precursor Multi-source supplies
Delivery type Injection of vaporized source with carrier gas 
Highly reliable valves KITZ (JAPAN) 
Sample size 2, 4, 6, 8 inch in diameter 
Loading wafer type Silicon wafer, glass, etc  
Film uniformity ≤5% (Al2O3 within 8”)
MFC flow rate (Ar, N2) 0 ~ 500 sccm
Chamber inner space height ~8mm
Foot print 660 x 1000 mm
Wafer loading Open load
Vacuum gauge  Capacitance manometer (up to 10 Torr)
User interface Desktop-window GUI
Ultimate pressure (rotary pump)

~ 10-3  torr