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Name | BEILab Study Series - ALD 8 inch |
---|---|
Main dimensions | 1000 x 660 x 1080 (L x W x H) |
Substrate temperature range | RT ~ 330¡É |
ALD type | Thermal ALD (flow-through type) |
Precursor | Multi-source supplies |
Sample size | 2, 4, 8, or 12 inch in diameter |
Film uniformity | ¡Â5% (Al2O3 |
MFC flow rate (Ar, N2 |
0 ~ 500 sccm |
Wafer loading | Open load |
User interface | Desktop-window GUI |
Ultimate pressure (rotary pump) |
~ 10-3
|
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